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1. Ma Zhi-bin, Wang Jian-hua, Wang Chuan-xin, Man Wei-dong. Microwave Plasma Chemical Vapor Deposition of Diamond Films on Silicon
from Ethanol and Hydrogen. Plasma Science & Technology, 5(2)2003:1735-1741;
2. Ma Zhi-bin, Jun Wan, Yangfeng Huang, Jian-hua Wang, Preparation of carbon films from organic solutions by pulsed arc discharge at
atmospheric pressure, Thin Solid Films 444(2003):99-103.
3. Ma Zhi-bin, Wan Jun, Wang Jian-hua,Zhang Wenwen. Improvement on diamond nucleation treated by pulsed arc discharge plasma.
Plasma Science & Technology, 6(3)2004: 2333-2336;
4. Z. B. Ma, J.H. Wang, W.W. Zhang, A.H He. Investigation of nucleation and adhesion of diamond films on mirror-smooth glass
substrates. Surface & Coatings Technology, 184(2-3)2004: 307-310;
5. Z. B. Ma, J.H. Wang, J. Wan Synthesis of carbon films with diamond phase from methanol solution by pulsed arc discharge.
Diamond & Related Materials, 13(12)2004:1889-1891.
6. W. D. Man, J. H. Wang , Z. B. Ma, C. X. Wang. Effect of plasma boronitriding on diamond nucleation and growth onto
cemented carbide substrates. Plasma Science & Technology, 2002, 4(12), 1559-1564.
专利:制备结晶氮化碳薄膜的装置(实用新型专利),设计人:马志斌,万军,汪建华,王卫红. 专利号:ZL03 2 54381.6
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